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::: 可授權專利

Apparatus and Adjusting Technology for Uniform Thermal Processing

創作型式:
發明
專利證號:
US7262390B2
發明人:
余孟泉、蘇俊傑、賴奕翔、蘇泳森、林銘俊、曹仁杰
國別:
美國
獲證日期:
2007/08/28
專利摘要:
Disclosed is a method for making a pure aluminum nitride substrate. At first, aluminum nitride is mixed with a water-resistant material and an adhesive material. The mixture is made into grains in a granulation process. The grains are molded into a nugget in a steel mode by hydraulic pressure. The nugget is subjected to a cold isostatic pressing process. At a low temperature, the water-resistant material and the adhesive material are removed from the nugget. Then, the nugget, boron nitride and nitrogen are introduced into and sintered in an oven, thus providing a pure aluminum nitride substrate. The purity and quality of the aluminum nitride substrate are high. The aluminum nitride substrate can be used in a light-emitting diode. The method is simple, the yield is high, and the heat radiation of the aluminum nitride substrate is excellent.
IPC國際分類號:
C01B0021072