*

::: 可授權專利

一種改善氮化鋁基板與銅鍍層之界面應力的結構

創作型式:
發明
專利證號:
JP6277174
發明人:
吳俊德、郭養國
國別:
日本
獲證日期:
2018/01/19
專利摘要:
A polymer with alternating phenylene silicon and siloxane structure and a method of producing a precursor of the same are introduced to develop an autonomous synthesis process for para-phenylene disilanol monomer compounds and design a technique of purifying the polymer with alternating phenylene silicon and siloxane structure easily, so as to enable mass production of the polymer with alternating phenylene silicon and siloxane structure.
IPC國際分類號:
C07F000708