| 專利摘要 | 本創作揭露一種靜電吸附加熱玻璃基板承載平台，用以對玻璃基板進行電漿反應沉積製程。電漿反應沈積裝置包含腔體以及承載平台。承載平台設置於腔體內。承載平台包含加熱模組以及吸附模組。加熱模組用以提供熱能，並且吸附模組設置於加熱模組上。吸附模組包含電路板以及絕緣薄膜。絕緣薄膜形成於電路板上，用以供玻璃基板放置。其中當玻璃基板放置於絕緣薄膜上時，電路板係透過該絕緣薄膜對玻璃基板產生靜電吸附效應，進而使得玻璃基板吸附於絕緣薄膜上，加熱模組隨即將熱能經由吸附模組傳導至玻璃基板。 The invention discloses a carrying platform for electrostatic attraction and heating glass substrate for pfocessing a plasma reaction deposition process at a glass substrate. The carrying platform for electrostatic attraction and heating glass substrate includes a chamber and a carrying platform. The carrying platform is disposed in the chamber. The carrying platform includes a heating module and an adhesion module. The heating module is for providing heat, and the adhesion module is disposed on the heating module. The adhesion module includes a circuit board and an insulating film. The insulating film is formed on the circuit board for the glass substrate allocation. Wherein, when the glass substrate is put on the insulating film, the circuit board generates an electrostatic force to hold the glass substrate through the insulating film. The heating module then provides the heat, through the adhesion module, to the glass substrate as well. |