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專利名稱 Method of making UV lamp for air cleaning
專利證號 US6135838A
國別 美國
獲證日期 2000-10-24
專利摘要 The invention relates to a method for fabricating a UV lamp for treating waste gas and to a UV lamp for treating waste gases fabricated therefrom, which is designed and fabricated based on solgel coating techniques by coating a sol of photocatalytic materials comprising anatasse TiO.sub.2 as the main component, and/or other semi-conductive components such as WO.sub.3, ZnO, SnO.sub.2, or Fe.sub.2 O.sub. 3, on a glass-fiber-cloth, and/or then impregnate this cloth with oxidation catalyst of precious metal such as Pd, Au, Pt or Ag, or transition metal oxide about Mo, Nb, B, Ce or Cr, and then wrap this cloth on a UV lamp. The invention relates also to a process for treating waste gases by using said UV lamp for treating waste gas through irradiating UV light therefrom on the surface of such photocatalytic materials to generate free electron and electron hole pairs which can decompose waste gases such as organic or inorganic pollutants in the air into unharmful gases. The invention relates to a method for fabricating a UV lamp for treating waste gas and to a UV lamp for treating waste gases fabricated therefrom, which is designed and fabricated based on solgel coating techniques by coating a sol of photocatalytic materials comprising anatasse TiO2 as the main component, and/or other semi-conductive components such as WO3, ZnO, SnO2, or Fe2O3, on a glass-fiber-cloth, and/or then impregnate this cloth with oxidation catalyst of precious metal such as Pd, Au, Pt or Ag, or transition metal oxide about Mo, Nb, B, Ce or Cr, and then wrap this cloth on a UV lamp. The invention relates also to a process for treating waste gases by using said UV lamp for treating waste gas through irradiating UV light therefrom on the surface of such photocatalytic materials to generate free electron and electron hole pairs which can decompose waste gases such as organic or inorganic pollutants in the air into unharmful gases.

IPC國際分類號

A61L000920