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專利名稱 Apparatus and Adjusting Technology for Uniform Thermal Processing
創作型式 發明
專利證號 US7262390B2
國別 美國
獲證日期 2007/08/28
專利摘要 Disclosed is a method for making a pure aluminum nitride substrate. At first, aluminum nitride is mixed with a water-resistant material and an adhesive material. The mixture is made into grains in a granulation process. The grains are molded into a nugget in a steel mode by hydraulic pressure. The nugget is subjected to a cold isostatic pressing process. At a low temperature, the water-resistant material and the adhesive material are removed from the nugget. Then, the nugget, boron nitride and nitrogen are introduced into and sintered in an oven, thus providing a pure aluminum nitride substrate. The purity and quality of the aluminum nitride substrate are high. The aluminum nitride substrate can be used in a light-emitting diode. The method is simple, the yield is high, and the heat radiation of the aluminum nitride substrate is excellent.

IPC國際分類號

C01B0021072
聯絡人 王淳右
電話 #329566
EMAIL f437frank@ncsist.org.tw