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專利名稱 一種改善氮化鋁基板與銅鍍層之界面應力的結構
創作型式 發明
專利證號 JP6277174
國別 日本
獲證日期 2018/01/19
專利摘要 A polymer with alternating phenylene silicon and siloxane structure and a method of producing a precursor of the same are introduced to develop an autonomous synthesis process for para-phenylene disilanol monomer compounds and design a technique of purifying the polymer with alternating phenylene silicon and siloxane structure easily, so as to enable mass production of the polymer with alternating phenylene silicon and siloxane structure.

IPC國際分類號

C07F000708
聯絡人 王淳右
電話 #329566
EMAIL f437frank@ncsist.org.tw